| 1. Identity statement | |
| Reference Type | Journal Article |
| Site | mtc-m16.sid.inpe.br |
| Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
| Identifier | 6qtX3pFwXQZ3r59YDa/KnN49 |
| Repository | sid.inpe.br/iris@1916/2006/03.07.13.51 (restricted access) |
| Last Update | 2006:03.07.13.51.00 (UTC) administrator |
| Metadata Repository | sid.inpe.br/iris@1916/2006/03.07.13.51.34 |
| Metadata Last Update | 2018:06.05.01.20.24 (UTC) administrator |
| Secondary Key | INPE-13581-PRE/8791 |
| ISSN | 0257-8972 |
| Citation Key | UedaBeloReutPara:2001:FoSiSi |
| Title | Plasma immersion ion implantation of nitrogen in Si: formation of SiO2, Si3N4 and stressed layers under thermal and sputtering effects  |
| Year | 2001 |
| Month | Feb |
| Access Date | 2024, May 19 |
| Secondary Type | PRE PI |
| Number of Files | 1 |
| Size | 181 KiB |
| 2. Context | |
| Author | 1 Ueda, Mario 2 Beloto, Antonio Fernando 3 Reuther, H. 4 Parascandola, S. |
| Resume Identifier | 1 8JMKD3MGP5W/3C9JHSB 2 8JMKD3MGP5W/3C9JGJ8 |
| Group | 1 LAP-INPE-MCT-BR 2 LAS-INPE-MCT-BR |
| Affiliation | 1 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasmas, (INPE, LAP) |
| Journal | Surface and Coatings Technology |
| Volume | 136 |
| Number | 1-3 |
| Pages | 244-248 |
| History (UTC) | 2006-03-07 13:51:34 :: vinicius -> administrator :: 2008-06-10 22:25:27 :: administrator -> vinicius :: 2011-05-28 13:31:58 :: vinicius -> administrator :: 2018-06-05 01:20:24 :: administrator -> marciana :: 2001 |
| 3. Content and structure | |
| Is the master or a copy? | is the master |
| Content Stage | completed |
| Transferable | 1 |
| Content Type | External Contribution |
| Keywords | plasma immersion ion implantation silicon nitride surface modification Auger electron spectroscopy |
| Abstract | Plasma immersion ion implantation (PIII) of nitrogen in silicon (Si) wafers was carried out using a de glow discharge plasma source and a hard tube pulser. Ion irradiation times ranging from 3 to 60 min were used to accumulate different doses. Surface analysis of these samples was carried out by Auger electron spectroscopy (AES), revealing a high atomic concentration of nitrogen (up to 60%) in the as-implanted Si wafer, besides the presence of different impurities as oxygen and carbon in significant quantities. Depth profiles of these elements were obtained as well as of compound species as SiO2 and Si3N4, using this high-energy resolution AES. Comparing the concentration profiles of implanted nitrogen in Si and the corresponding retained doses in these samples, it was possible to understand the thermal and sputtering effects in our present PIII experiment. High-resolution XRD results corroborate the formation of highly stressed layers in the as-implanted substrates. These experimental results are compared to simulations obtained by TRIDYN code. (C) 2001 Elsevier Science B.V. All rights reserved. |
| Area | FISPLASMA |
| Arrangement 1 | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAS > Plasma immersion ion... |
| Arrangement 2 | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Plasma immersion ion... |
| doc Directory Content | access |
| source Directory Content | there are no files |
| agreement Directory Content | there are no files |
| 4. Conditions of access and use | |
| Language | en |
| Target File | 51.pdf |
| User Group | administrator vinicius |
| Visibility | shown |
| Copy Holder | SID/SCD |
| Archiving Policy | denypublisher denyfinaldraft24 |
| Read Permission | deny from all and allow from 150.163 |
| 5. Allied materials | |
| Next Higher Units | 8JMKD3MGPCW/3ESR3H2 8JMKD3MGPCW/3ET2RFS |
| Dissemination | WEBSCI; PORTALCAPES. |
| Host Collection | sid.inpe.br/banon/2003/08.15.17.40 |
| 6. Notes | |
| Empty Fields | alternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype |
| 7. Description control | |
| e-Mail (login) | marciana |
| update | |